High N.A. UV Micro Objectives

Special Optics High N.A. focusing objectives have some of the highest numerical aperture designs in the optical industry. Designs achieving 0.50N.A., 0.75N.A. and 0.90 N.A. are available for a variety of material processing and laser micromachining applications that use high powered UV lasers.

Built with a diffraction limited design our objectives allow laser micromachining processes such as cutting, drilling, writing and hole-shaping to be performed with the highest accuracy, and can eliminate any cemented surfaces that would limit the usable power.

Our focusing objectives are aberration corrected for either 248nm or 365nm. The design ensures that the optical system is fully corrected at 248nm or 365nm. All the objective surfaces are AR coated (anti-reflective).

Specifications:			Features
Wavefront Distortion	< 1/4 Wave		Diffraction Limited Design Air-Spaced for High Power Applications
Transmission	> 97%
Coating Damage Threshold	500 MW/cm2
Surface Quality	20-10

Please replace λ in model number with working wavelength when ordering.